IRIS

Sfoglia per Autore  

Opzioni
Mostrati risultati da 21 a 40 di 124
Titolo Data di pubblicazione Autore(i) File
Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas 1-gen-2004 Milella, Antonella; F., Palumbo; Favia, Pietro; G., Cicala; R., Dagostino
Continuous and pulsed PECVD of ultralow-k dielectrics from various olefinic silane and siloxane discharges 1-gen-2005 Milella, Antonella; J. L., Delattre; Fracassi, Francesco; Dagostino, R.
Plasma pre-treatments and treatments on Poly-TetraFluoroEthylene for reducing the hydrophobic recovery 1-gen-2005 Favia, Pietro; Milella, Antonella; Iacobelli, L; D'Agostino, R.
Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges 1-gen-2005 Milella, A; Palumbo, F; Favia, P; Cicala, G; D'Agostino, R
Optical and morphological studies on SiO2-like films deposited by means of ion bombardment-assisted expanding thermal plasma CVD 1-gen-2006 Milella, Antonella; M., Creatore; M. A., Blauw; M. C. M., VAN DE SANDEN
’Influence of the ion bombardment on the growth and moisture permeation barrier properties of SiO2-like films deposited by remote plasma’ 1-gen-2006 Milella, Antonella; M., Creatore; M. A., Blauw; M. C. M., VAN DE SANDEN
Remote plasma deposition of inorganic films: the influence of plasma chemistry and ion bombardment on film growth and moisture permeation barrier performances 1-gen-2006 M., Creatore; M. A., Blauw; J. L., VAN HEMMEN; I., Volintiru; M. M., Koetse; V. I. T. A., Lohnmann; M. C. M., VAN DE SANDEN; Milella, Antonella; H. F. M., Schoo
Evolution of surface morphology of SiO2-like films deposited by means of the Expanding Thermal Plasma 1-gen-2006 Milella, Antonella; M. P., Rossiau; M., Creatore; M. C. M., VAN DE SANDEN
Influence of the ion bombardment on the growth of plasma-deposited SiO2-like films on polymers 1-gen-2006 Milella, Antonella; M., Creatore; M. A., Blauw; M. C. M., VAN DE SANDEN
From low-k to ultralow-k thin film deposition by organosilicon glow discharges 1-gen-2006 Milella, Antonella; Delattre, J. L.; Palumbo, F.; Fracassi, Francesco; D'Agostino, Riccardo
’SiOx structural modifications by ion bombardment and their influence on electrical properties 1-gen-2006 Milella, Antonella; M., Creatore; M. C. M., VAN DE SANDEN; N., Tomozeiu
Ion energy and ion flux control during deposition of thin oxide films 1-gen-2007 M. C. M., VAN DE SANDEN; Milella, Antonella; Milella, A; Blauw, M. A; Rumphorst, R. F; Creatore, M.
Plasma deposition of organosilicon coatings as low-k dielectrics 1-gen-2007 Milella, Antonella; A. M., Coclite; F., Palumbo; Fracassi, Francesco; R., Dagostino
Advanced plasma treatments for cleaning and protection of metal artefacts 1-gen-2007 Milella, Antonella; S., Grassini; F., Palumbo; E., Angelini; Fracassi, Francesco; R., Dagostino
Plasma deposition of SiO2-like films: role of the ion bombardment on film structure and properties 1-gen-2007 Milella, Antonella; M., Creatore; M. A., Blauw; M. C. M., VAN DE SANDEN
Deposition and Characterization of dielectric thin films from allyltrimethylsilane glow discharges 1-gen-2007 Milella, Antonella; Palumbo, F; Delattre, J. L.; Fracassi, Francesco; Dagostino, R.
Remote Plasma Deposited Silicon Dioxide-Like Film Densification by Means of RF Substrate Biasing: Film Chemistry and Morphology 1-gen-2007 Milella, Antonella; M., Creatore; M. A., Blauw; M. C. M., VAN DE SANDEN
Catalyst thin layer and method for fabricating the same 1-gen-2008 Martin, Steve; D'Agostino, Riccardo; Latour, Antoine; Milella, Antonella; Palumbo, Fabio; Thery, Jessica
Nanotexturing of polymers by cold plasmas: switching from sticky to slippery superhydrophobicity 1-gen-2008 F., Palumbo; R., Dagostino; Milella, Antonella; R., DI MUNDO; F., Intranuovo
Plasma nanostructuring for advanced functional materials 1-gen-2008 Milella, Antonella; R., DI MUNDO; E., Dilonardo; F., Intranuovo; F., Palumbo; Fracassi, Francesco; Favia, Pietro; R., Dagostino
Mostrati risultati da 21 a 40 di 124
Legenda icone

  •  file ad accesso aperto
  •  file disponibili sulla rete interna
  •  file disponibili agli utenti autorizzati
  •  file disponibili solo agli amministratori
  •  file sotto embargo
  •  nessun file disponibile