Sequential process control is essential for many thin film processing techniques such as atomic1 and molecular layer deposition2 (ALD and MLD), molecular beam epitaxy,3 and atomic layer etching.4 In these processes, valves or shutters are used to dose precursors in a vacuum reactor. The dosing has to happen in a fully automated and reproducible way and often has to be quite short (e.g., around ∼10 ms for metalor- ganic precursors in ALD). Furthermore, novel hybrid materials require exact control of the composition and grading of their various components to obtain the desired properties.5
Universal software for the real-time control of sequential processing techniques
Coclite A. M.
2019-01-01
Abstract
Sequential process control is essential for many thin film processing techniques such as atomic1 and molecular layer deposition2 (ALD and MLD), molecular beam epitaxy,3 and atomic layer etching.4 In these processes, valves or shutters are used to dose precursors in a vacuum reactor. The dosing has to happen in a fully automated and reproducible way and often has to be quite short (e.g., around ∼10 ms for metalor- ganic precursors in ALD). Furthermore, novel hybrid materials require exact control of the composition and grading of their various components to obtain the desired properties.5File in questo prodotto:
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