COCLITE, ANNA MARIA

COCLITE, ANNA MARIA  

DIPARTIMENTO INTERATENEO DI FISICA  

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Risultati 1 - 20 di 89 (tempo di esecuzione: 0.051 secondi).
Titolo Data di pubblicazione Autore(i) File
25th Anniversary Article: CVD polymers: A new paradigm for surface modification and device fabrication 1-gen-2013 Coclite, A. M.; Howden, R. M.; Borrelli, D. C.; Petruczok, C. D.; Yang, R.; Yague, J. L.; Ugur, A.; Chen, N.; Lee, S.; Jo, W. J.; Liu, A.; Wang, X.; Gleason, K. K.
A Chemical Study of Plasma-Deposited Organosilicon Thin Films as Low-k Dielectrics 1-gen-2009 A. M., Coclite; Milella, Antonella; F., Palumbo; Fracassi, Francesco; R., D'Agostino
Advances in surface modification and functionalization for tailoring the characteristics of thin films and membranes via chemical vapor deposition techniques 1-gen-2023 Hossein Mostafavi, Amir; Kumar Mishra, Ajay; Gallucci, Fausto; Hak Kim, Jong; Ulbricht, Mathias; Coclite, ANNA MARIA; Saeid Hosseini, Seyed
Applicability of Vapor-Deposited Thermoresponsive Hydrogel Thin Films in Ultrafast Humidity Sensors/Actuators 1-gen-2020 Muralter, F.; Greco, F.; Coclite, A. M.
Applications of soft biomaterials based on organic and hybrid thin films deposited from the vapor phase 1-gen-2023 Marcelja, S.; Demelius, L.; Ali, T. A.; Aghito, M.; Muralter, F.; Rodriguez, G. H.; Krauter, M.; Unger, K.; Wolfsberger, L.; Coclite, A. M.
Capillary-Driven Water Transport by Contrast Wettability-Based Durable Surfaces 1-gen-2023 Dimitriadis, T.; Stendardo, L.; Tagliaro, I.; Coclite, A. M.; Antonini, C.; Maitra, T.
Chemical and morphological characterization of low-k dielectric films deposited from Hexamethyldisiloxane and Ethylene RF glow discharges 1-gen-2010 A. M., Coclite; Milella, Antonella; F., Palumbo; Fracassi, Francesco; R., Dagostino
Chemical vapor deposition for solvent-free polymerization at surfaces 1-gen-2013 Yague, J. L.; Coclite, A. M.; Petruczok, C.; Gleason, K. K.
Chemical vapor deposition of carbohydrate-based polymers: a proof of concept study 1-gen-2023 Materna, P.; Illek, D.; Unger, K.; Thonhofer, M.; Wrodnigg, T. M.; Coclite, A. M.
Conformal coating of powder by initiated chemical vapor deposition on vibrating substrate 1-gen-2020 Unger, K.; Coclite, A. M.
Controlled Wrinkle Patterning on Thin Films to Improve Hydrophobicity 1-gen-2024 Aghito, Margherita; Hernandéz Rodríguez, Gabriel; Antonini, Carlo; Coclite, ANNA MARIA
Controlling Indomethacin Release through Vapor-Phase Deposited Hydrogel Films by Adjusting the Cross-linker Density 1-gen-2018 Christian, P.; Tumphart, S.; Ehmann, H. M. A.; Riegler, H.; Coclite, A. M.; Werzer, O.
Controlling the degree of crystallinity and preferred crystallographic orientation in poly-perfluorodecylacrylate thin films by initiated chemical vapor deposition 1-gen-2012 Coclite, A. M.; Shi, Y.; Gleason, K. K.
Crystallization of Tyrian purple (6,6′-dibromoindigo) thin films: The impact of substrate surface modifications 1-gen-2016 Truger, M.; Jones, A. O. F.; Coclite, A. M.; Pachmajer, S.; Kriegner, D.; Rothel, C.; Simbrunner, J.; Salzmann, I.; Resel, R.
CVD of polymeric thin films: Applications in sensors, biotechnology, microelectronics/organic electronics, microfluidics, MEMS, composites and membranes 1-gen-2012 Ozaydin-Ince, G.; Coclite, A. M.; Gleason, K. K.
CVD Polymer Surfaces for Biotechnology and Biomedicine 1-gen-2015 Coclite, ANNA MARIA
Deep tissue localization and sensing using optical microcavity probes 1-gen-2022 Kavcic, A.; Garvas, M.; Marincic, M.; Unger, K.; Coclite, A. M.; Majaron, B.; Humar, M.
Deposition kinetics and characterization of stable ionomers from hexamethyldisiloxane and methacrylic acid by plasma enhanced chemical vapor deposition 1-gen-2016 Urstoger, G.; Resel, R.; Koller, G.; Coclite, A. M.
Deposition of Ion-Conductive Membranes from Ionic Liquids via Initiated Chemical Vapor Deposition 1-gen-2020 Krauter, M.; Tazreiter, M.; Perrotta, A.; Coclite, A. M.
Different Response Kinetics to Temperature and Water Vapor of Acrylamide Polymers Obtained by Initiated Chemical Vapor Deposition 1-gen-2018 Salzmann, P.; Perrotta, A.; Coclite, A. M.