A plasma enhanced chemical vapor deposition process was proposed to functionalize the P3HT organic semiconductor surface of electrolyte gated organic field effect transistors with hydrophilic coatings bearing –COOH groups. Results demonstrate that the developed plasma process allows to functionalize the P3HT surfaces with carboxyl groups with negligible adverse effect on the bulk properties of P3HT as well as on EGOFET performances.

PE-CVD of hydrophilic -COOH functionalized coatings on electrolyte gated field-effect transistor electronic layers.

MAGLIULO, MARIA;DITARANTO, NICOLETTA;CIOFFI, NICOLA;FAVIA, Pietro;TORSI, Luisa
2013-01-01

Abstract

A plasma enhanced chemical vapor deposition process was proposed to functionalize the P3HT organic semiconductor surface of electrolyte gated organic field effect transistors with hydrophilic coatings bearing –COOH groups. Results demonstrate that the developed plasma process allows to functionalize the P3HT surfaces with carboxyl groups with negligible adverse effect on the bulk properties of P3HT as well as on EGOFET performances.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11586/129832
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