Advances are presented in the study of chemical composition, properties and deposition mechanism of thin films deposited via RF glow discharges fed with oxygen and/or silicon-containing organic monomers. The effect of substrate temperature, ion-bombardment, and feed O2/Monomer ratio are described. A general deposition mechanism is proposed.
Plasma and surface diagnostics in PECVD from silicon containing organic monomers
FAVIA, Pietro;FRACASSI, Francesco
1994-01-01
Abstract
Advances are presented in the study of chemical composition, properties and deposition mechanism of thin films deposited via RF glow discharges fed with oxygen and/or silicon-containing organic monomers. The effect of substrate temperature, ion-bombardment, and feed O2/Monomer ratio are described. A general deposition mechanism is proposed.File in questo prodotto:
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