In this paper we present a parametric study of the effect of discharge voltage on capacitively coupled, parallel plate (CCPP) radio frequency discharges in pure hydrogen at low pressure, performed using a 1D(r)2D(v) particle in cell/Monte Carlo collision model with self-consistent neutral kinetics and also compare our results with experimental and theoretical ones reported in the literature. In the first part of the paper, we review the essential features of the numerical code, together with the database of plasma particles and neutral kinetics data. Results are discussed, in particular, for charged particle density and energy, the appearance of the double layer phenomenon, the plasma potential and the atom density. A possible role of photoelectric emission in the charged particle balance is also discussed.

Effect of discharge voltage on capacitively coupled, parallel plate rf hydrogen plasmas 

LONGO, Savino
2005-01-01

Abstract

In this paper we present a parametric study of the effect of discharge voltage on capacitively coupled, parallel plate (CCPP) radio frequency discharges in pure hydrogen at low pressure, performed using a 1D(r)2D(v) particle in cell/Monte Carlo collision model with self-consistent neutral kinetics and also compare our results with experimental and theoretical ones reported in the literature. In the first part of the paper, we review the essential features of the numerical code, together with the database of plasma particles and neutral kinetics data. Results are discussed, in particular, for charged particle density and energy, the appearance of the double layer phenomenon, the plasma potential and the atom density. A possible role of photoelectric emission in the charged particle balance is also discussed.
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11586/54760
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 64
  • ???jsp.display-item.citation.isi??? 63
social impact