Thin films have been deposited from radio-frequency glow discharges fed with vapors of a silicon- and fluorine-containing organic compound, namely 2,4,6-tris[(3,3,3-trifluoropropyl)(methyl)] cyclotrisiloxane, in mixture with argon.
Plasma deposition of thin films from a F-containing cyclo-siloxane
FAVIA, Pietro;
1994-01-01
Abstract
Thin films have been deposited from radio-frequency glow discharges fed with vapors of a silicon- and fluorine-containing organic compound, namely 2,4,6-tris[(3,3,3-trifluoropropyl)(methyl)] cyclotrisiloxane, in mixture with argon.File in questo prodotto:
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