Thin films containing carboxylic acid groups are deposited from mixtures of helium, acrylic acid, and ethylene using an atmospheric pressure cold plasma jet in dielectric barrier discharge (DBD) configuration. The influence of the feed gas composition on the properties of the deposits is investigated. As assessed by X-ray photoelectron spectroscopy (XPS), the oxygen atomic concentration of the coatings as well as the percentage of the XPS C1s component ascribed to carboxylic groups (i.e., COOH and COOR moieties) increase with the acrylic acid concentration in the feed gas. On the other hand, ethylene addition enhances the deposition rate, reduces the carboxylic groups content of the coatings, and significantly improves their chemical and morphological stability upon immersion in water for 72 h. The surface concentration of COOH groups before and after immersion in water is determined by chemical derivatization in conjunction with XPS.
Deposition of Water-Stable Coatings Containing Carboxylic Acid Groups by Atmospheric Pressure Cold Plasma Jet
BOSSO, PIERA;FRACASSI, Francesco
2016-01-01
Abstract
Thin films containing carboxylic acid groups are deposited from mixtures of helium, acrylic acid, and ethylene using an atmospheric pressure cold plasma jet in dielectric barrier discharge (DBD) configuration. The influence of the feed gas composition on the properties of the deposits is investigated. As assessed by X-ray photoelectron spectroscopy (XPS), the oxygen atomic concentration of the coatings as well as the percentage of the XPS C1s component ascribed to carboxylic groups (i.e., COOH and COOR moieties) increase with the acrylic acid concentration in the feed gas. On the other hand, ethylene addition enhances the deposition rate, reduces the carboxylic groups content of the coatings, and significantly improves their chemical and morphological stability upon immersion in water for 72 h. The surface concentration of COOH groups before and after immersion in water is determined by chemical derivatization in conjunction with XPS.File | Dimensione | Formato | |
---|---|---|---|
ppap.201500005.pdf
non disponibili
Tipologia:
Documento in Versione Editoriale
Licenza:
NON PUBBLICO - Accesso privato/ristretto
Dimensione
743.21 kB
Formato
Adobe PDF
|
743.21 kB | Adobe PDF | Visualizza/Apri Richiedi una copia |
Bosso et al_Plasma Process Polym submitted revised&accepted.pdf
accesso aperto
Descrizione: Articolo principale
Tipologia:
Documento in Post-print
Licenza:
Creative commons
Dimensione
1.85 MB
Formato
Adobe PDF
|
1.85 MB | Adobe PDF | Visualizza/Apri |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.