It is shown that it is possible to deposit thin films with various CFx composition (1.26 less-than-or-equal-to x less-than-or-equal-to 1.83) by ion-beam sputtering. These materials with ''teflon-like'' composition have been deposited at room temperature by Ar ion-beam sputtering of a teflon target; the film chemical composition has been determined by electron spectroscopy for chemical analysis. The fluorine-to-carbon ratio of the films, as well as their crosslinking degree, is shown to depend on the energy of the ions impinging on the target.

Ion-beam sputtering deposition of fluoropolymer thin films

VALENTINI, Antonio;FAVIA, Pietro;D'AGOSTINO, Riccardo
1993-01-01

Abstract

It is shown that it is possible to deposit thin films with various CFx composition (1.26 less-than-or-equal-to x less-than-or-equal-to 1.83) by ion-beam sputtering. These materials with ''teflon-like'' composition have been deposited at room temperature by Ar ion-beam sputtering of a teflon target; the film chemical composition has been determined by electron spectroscopy for chemical analysis. The fluorine-to-carbon ratio of the films, as well as their crosslinking degree, is shown to depend on the energy of the ions impinging on the target.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11586/129864
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